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|Closed Microchannel For Electrowetting On Dielectric Based Mircofluidics Using E-Beam Lithography
A method for fabricating micro-channels for electro wetting on dielectric based micro-fluidics. The method includes the steps of providing a base substrate, oxidizing the base substrate to provide substrate oxide, depositing an electrode layer on the substrate oxide, delineating the electrode layer, depositing a first hydrophobic layer on the delineated electrode layer, depositing a second hydrophobic layer anddepositing and patterning a ground electrode layer. The second hydrophobic layer is subjected to photolithography for opening the micro-channel in electro wetting on dielectric based micro-fluidics.
Indian patent application no. 1950/MUM/2012
Inventors: V Ramgopal Rao, Vijay Kumar, N. N. Sharma