|File Last modified on: Wed Nov 18, 2020 22:50:28|
|Closed Microchannel For Electrowetting On Dielectric Based Mircofluidics Using E-Beam Lithography|
A method for fabricating micro-channels for electro wetting on dielectric based micro-fluidics. The method includes the steps of providing a base substrate, oxidizing the base substrate to provide substrate oxide, depositing an electrode layer on the substrate oxide, delineating the electrode layer, depositing a first hydrophobic layer on the delineated electrode layer, depositing a second hydrophobic layer anddepositing and patterning a ground electrode layer. The second hydrophobic layer is subjected to photolithography for opening the micro-channel in electro wetting on dielectric based micro-fluidics.
Indian patent application no. 1950/MUM/2012
Inventors: V Ramgopal Rao, Vijay Kumar, N. N. Sharma